专利摘要:
By means of the nozzle, three gaseous curtains are formed converging on the surface of the substrate heated to a temperature of about 600 DEG C. which is driven in translatory movement, the intermediate curtain being constituted by a gaseous reactant or a reactant diluted in a carrier gas and the two lateral curtains being constituted by another naturally gaseous reactant or reactant diluted in a gas. The gaseous products of the reaction issuing from the nozzle are compelled to flow above a predetermined region of the substrate and these products are evacuated by suction by means of channels disposed at the extremities of this region of the substrate and a pump to which the channels are connected.
公开号:SU1371499A3
申请号:SU802878803
申请日:1980-02-13
公开日:1988-01-30
发明作者:Кальбскопф Рейнхард;Баумбергер Отто
申请人:Сочиетта Италиана Ветро-Сив,С.П.А. (Фирма);
IPC主号:
专利说明:

00

 with so

04
113
The invention relates to the glass industry, in particular to devices for applying a layer of semiconductor material with a high transparency, a relatively small electrical resistivity and high mechanical strength to a transparent substrate.
The purpose of the invention is to reduce the electrical resistivity with high transparency of the coating. This device is intended to coat a layer of tin oxide or titanium oxide by chemical vapor deposition onto a substrate.
Figure 1 presents the proposed device, a General view; figure 2 and 3 variants of the device; figure 4 is a device, a vertical section, shown in figure 1.
The device comprises a series of rolls 1 on which a sheet V is located and in which the sheet V moves in the direction F, and these rolls are driven counterclockwise and an electric motor (not shown) and have a length compatible with the glass sheet irina are carried. The speed of rotation of the rolls 1 must be chosen so that the movement of the sheet V takes place at a linear speed of several meters per minute (on the order of 1-10).
Above the rolls 1 is placed a nozzle 2, the principal structural profile of which is shown in FIG. 2. This nozzle contains three isolated channels 3, 4 and 5, placed in the longitudinal direction parallel to the rolls 1 for a length corresponding to the width of the glass sheet V. These channels may, therefore, have a length of even several meters. Channels 3-5 are formed by assembling long profiles 6.7 and 8, interconnected by appropriate means, with two pairs of profiles and limiting passages 11, 12 and 13 between them, communicating with channels 3.4 and 5, respectively.
The profiled walls of Za and Zb, 4a and 4b, 5a and 56 of channels 3–5 converge to imaginary edge 1, which is separated from the plane containing the lower surface of profiles 6, by a length of about 3–6 mm. In addition, the outlet openings of channels 3, 4 and 5, which have
92
the shape of three elongated slots located along the entire length of profiles 6 and 7 have a width of several tenths
millimeter (1/10 or 2/10).
The width of the bottom surface of the profiles is between 10 and 20 times the total width of the exit slits of the channels 3-5.
It is preferable to cover the bottom surface of the profiles with a layer of a chemically inert metal or with an alloy of such metals, or with metal oxides. As an example of such a metal
can be called gold or platinum. Oxides can be selected from SnO, SiO or.
The assembled profiles forming the nozzle 2 are closed at each end with a shutter plate (not shown) installed in such a way as to ensure complete tightness and thus form channels 3,4 and 5 and passages 11,12 and 13, closed
at the side. Passes 14 arranged in
The upper part of the profiles 10 allows the circulation of a fluid, for example an oil, designed to maintain the optimum working temperature of the nozzle 2, over the entire length of the latter.
Another plate 15 hermetically closes the upper surface of the nozzle 2 throughout its length, preventing all communication between passages 11, 12 and 13.
The overall profile and the state of the surface of the walls, limiting both the channels 3-5 and the passages 11-13
(Fig. 2), as well as the cross sections of the latter, are such that, at gas flow rates of the order of 3-6 l / h per centimeter of the length of the nozzle, the flows at the exit of the nozzles will be laminar.
On both sides of the nozzle 2 and on
The entire length of the latter device contains two boxes 16 and 17 for removing reaction gases (Figures 1 and 4) of square cross section, the bottom surface of which is coplanar with the bottom surface of profiles 6. Each of these boxes is provided with longitudinal slots 16a and 166 for box 16 and.
17a and 176 for the duct 17. These ducts are connected via a piping system 18 to the inlet of the suction pump 9, the outlet of which is connected to the lower part of the wash basin 20, filled with refractory materials (the rings of the Yoke).
In addition, the device contains two thermostatic bubbler receivers 21 and 22, the first of which contains liquid tin chloride (SnCl) and the second water, two flow meters 23 and 24 equipped with valves 23a and 24a for controlling the flow supplied by a mixture of nitrogen and 60:40 hydrogen, two valves 25 and 26 located on pipelines 27 and 28 connecting flow meters to bubbler receivers below. Two conduits 29 and 30 connect the output of the receivers 21 and 22, respectively, to the passage 13 and the passages 11 and 12 of the nozzle 2, i.e. with the channel 5 of the nozzle for the pipeline 29 and with the channels 3 and 4 for the pipeline 30.
Pipelines 29 and 30 pass through chamber E, (shown schematically by a dashed-dotted line) containing a heat transfer fluid, such as oil, the temperature of which is kept constant (approximately 110 ° C) accordingly. The ratio of the distance between the imaginary edge and the nozzle outlet to the width of each valve is 15-60. The reflective surfaces have a length that is 10-20 times the sum of the width of the three nozzle outlets.
The proposed device makes it possible to apply, for example, a glass layer of tin oxide with a thickness of about 500 nm on the glass plate, which at the same time has very good transparency, relatively low electrical conductivity, excellent adhesion to glass and increased mechanical strength and resistance to acids.
Experiment. A device of this type, equipped with a nozzle with a length of 20 cm, whose apertures of channels 3.4 and 5 had widths of 0.1-0.1 and 0.2 mm allowed to process a glass plate 20 cm wide and 4 mm thick heated to about 600 ° C and moving in the F direction (Fig.1 and 4) at a speed of 2 m / min. The distance separating the lower surface of the nozzle and the surface of the glass was 6 mm.
Used receivers 21 and 22 with a capacity of approximately 200-300 ml (liquid
371499
SnCl for receiver zi and for receiver 22, respectively). These receivers were heated to such temperatures (at a flow rate of carrier gas N, / Hj 60 l / h for a receiver 21 and 120 l / h for a receiver 22, adjustable by valves 2Za and 24a, to obtain a consumption of reagent diluted in
10 this gas, 2 mol / h of tin chloride (SnCl4) and 1 mol / h. In addition, the temperature of the nozzle was maintained at about 110 ° C by circulating the oil in the passages 14 of this nozzle.
15 (figure 4).
Due to the profile communicated to the channels 3, 4 and 5 of the nozzle 2, and, in particular, because they converge their side walls to the imaginary edge 1, the gas flows out of these channels (the SnCl4 flow is for channel 5 and the vapor flow for channels 3 and 4), which are laminar, come into mutual contact, flowed tangentially, and then more directly as it approaches line 1, which is higher. The combined stream of these three gas streams becomes less laminar when there is mutual penetration of these streams one into the other, which takes place only in the immediate vicinity of the surface of the glass V, which is heated to about 600 ° C,
35 as indicated above, so that an addition reaction occurs on the glass
Sncl
but
sna + 4 HC1 /.
If no special measures are taken, this reaction will occur very violently with the formation of a large amount of tin dioxide (SnOj) of hydrates like SnO and HgO at the exit of channels 3-5 of nozzle 2, as a result of which there is a danger of partial or complete clogging of all or part of the channels by depositing the same tin oxides on the glass in the form of a white veil, and not in the form of the desired gt-conducting transparent layer.
When using the device, this danger is eliminated by adding SnCl and a reducing agent vapor in the form of gas introduced into a carrier gas to both gas streams. Vodo about
2
n
the genus is in fact a gas that does not interact with either SnCl4 or
Hjo. In addition, it acts as a catalyst, so it can be used as an inert carrier gas.
The addition reaction of SnCl and occurs not only in the central zone of the nozzle 2, i.e. in the vicinity of the part of this piping into which the channels 3,4 and 5 exit. This reaction takes place when the pump 19 is operated in such a way that the boxes 16 and 17 located on both sides of the nozzle create a vacuum on the right and left ends parts (according to the drawing) of the space enclosed between the glass plate V and the bottom surface of the nozzle profiles 6a and 66. As a result, in this space a gas stream is formed, going from the central part of this space to the ducts 16 and G /. These streams contain a part of SnCli, and, dispersed in a carrier gas and not yet reacted, HC1 pairs that have already formed and some amount of carrier gas that does not contain reagents, which have already reacted. Thus, the interaction between can continue with residual reactive materials for a certain length 1 on either side of the I channel cusping edge.
The suction power carried out by ducts 16 and 17 is chosen so that the reactive gases emitted from

harmful vapor, such as HC1, or hydrogen, to the surrounding atmosphere, since ambient air tends to flow towards slots 1b and 16b, respectively 17a and 176, the passage between ducts 16 and 17, glass plate V and nozzle.
Gaseous products sucked by pump 19 are directed to wash tower 20 so that volatile residual acids are percolated and carried away with water, the resulting acidic solution is separated from the washed gases and discharged through line 2 () a.
Under the specified operating conditions, the reaction yield was about 70%. A layer of SnOj 500 nm, transparency 90-95% according to the samples and with an average conductivity (Rn) 200 Ohms was applied on the glass over its entire surface.
In addition, the SnO layer thus obtained had a very high hardness exceeding the hardness of the glass on which it was deposited. Its resistance was very high both to very intense mechanical loads, such as shock, and to the effects of acids. This glass could have been given a bulge with a radius of curvature of 15 cm after it was heated to 600-700 ° C without any destruction of the SnO coating. It could also be hardened under the conditions of ordinary
0
five
0
nozzles 2 were located in this space only for the time exactly required to obtain the SnOj layer. on the glass, which is a transparent layer, and not a layer in the form of an increasing powdery layer of SnOj, i suction should not be too strong, because otherwise the reagent gases leaving the nozzle will not have time to reach the glass surface. The suction rate is therefore decisive for the quality and rate of increase of the bed. Due to the suction occurs isolation from the surrounding
the atmosphere of the space enclosed between the nozzle and the glass plate and in which the desired reaction takes place. There is an obstacle to the possible penetration of additional moisture into this space, which may affect the addition reaction, as well as all emissions.
0
five
0
five
for normal glass. In addition, a glass plate coated with a layer of SnO under the described conditions and qualities can be cut with diamond from both
sides without flaking off
Using this device and at operating conditions different from those indicated only by the speed of plate V movement (and this speed was increased to approximately 10 m / min), a SnO layer about 10 nm thick was obtained, with an average conductivity (Ra) of 1.5 kΩ with a transparency of almost 100% for visible radiation and mechanical properties almost equivalent to the layers obtained by moving the glass plate at a speed of 2 m / min.
The proposed device can also be used for chemical deposition of a TiO layer on a glass plate from the gas phase. To do this, it is sufficient to replace the TiOj 4 HCl / in the receiver.
 13
ba) b (lterg 21 h.lo1) And (o o choro (SnC) tetrachl (: 1 graded titanium (TiCH). You can also use the a-carrier, STATE 1, exclude p. but from nitrogen.
At the exit of the nozzle 2, the following reaction will take place:
TiCl +
The glass plate with a width of 20 cm and a thickness of A mm, heated to, was mixed in the longitudinal direction at a speed of 2 m / min in front of the nozzle 2 at a distance of 6 mm from the latter. C, using the 2Za and 2D valves, the flow rate of the carrier gas was adjusted to 60 l / h for the flow meter 23 and 120 l / h to the flow meter 24. The receivers 21 and 22 were also heated so that the reagent consumption was 0, 2 mol / h TiCl and 0.01 mol / h.
A TiO layer with a thickness of 0.01 μm was obtained, having a light transmission of about 75% and a reflectivity of about 50%, i.e. above the reflectivity of the glass on which the layer is applied. The mechanical strength was comparable to the mechanical strength of the SnO layer, prepared as described above.
Direct introduction of H to relieve the rapid reaction of the addition reaction of SnCl and H, jO vapor is not the only possible one. According to an embodiment, a carrier gas of STATUS exclusively from nitrogen can be used and the hydrogen required for reduction in place can be obtained from methanol CH, OH. On - figure 2 shows how the device in figure 1 should be in this case changed.
Such a device should contain, in addition to a receiver-bubbler 31 containing methanol, a flow meter 32 with a flow control valve 32a, a valve 33 located on the pipe 34 connecting the flow meter 32 to the receiver 31, and a pipe 35 connecting this receiver output to pipeline 30 and, therefore, with passages 11 and 12 of the nozzle 2, and therefore with the outer channels 3 and 4 of this nozzle 2.
Pipelines 29, 30 and 35 pass through chamber V, (shown schematically by a contour of dotted
9Q "
line) containing vein heat. the nagrimer is a mellower whose temperature is kept constant at about 110 (. appropriately.
In the presence of SnC. 1 methanol can interact with the latter as follows:
SnCl + 2CH, OH
SnO, Cl.
In addition, due to the relatively high temperature that exists at the exit of the channels, methanol can be decomposed according to rec.
  SP,
and can also interact with according to reaction
CH, OH + ,, - t- WITH
Both in one and in the other case, hydrogen is obtained in place, which is necessary to control the already indicated main reaction:
SnCl + / NgO
The SnO + 4HCl / Variant of the device shown in Fig. 3 is intended, in particular, to produce layers of SnO2 with antimony additives by replacing some tin atoms with atoms of antimony. Due to these additives, a very significant reduction in the electrical resistivity of the layer can be achieved.
Such inclusion of additives can be produced according to the following reaction:
2SbCl5 + + HCl, which additionally allows for the introduction of antimony ions into the crystalline structure SnOj.
Since antimony reacts with water but does not interact with tin chloride, the installation according to FIG. 3 is designed so that SbCl is present in the presence of only the nozzle 2, being mixed with tin chloride (SnCl). Thus, this reaction occurs simultaneously with the addition reaction of SnCl and vapors.
This device differs from the device shown in Fig. 1 added by a bubbler receiver 36 containing a liquid syringe SbClj, a flow meter 37 with a regulating valve 37a, a valve 38 located on the pipeline 3 and a pipeline 40 connecting the outlet of this receiver with the pipeline 2.9
h,
and, therefore, r by the central channel 5 of the nozzle through prohol 13 in this nozzle (fig.D).
The pipes 29, 30 and 40 pass through the chamber F ,, (shown schematically by a dashed-dotted line) containing (un} liquid heat carrier, for example an oil, the temperature of which is kept at a constant level approximately in an appropriate manner.
A device of this type, equipped with a nozzle with characteristics identical to the nozzle of the installation already described in FIG. 1, made it possible to apply a layer of SnO with an addition of 500 mm thick to a glass plate 20 cm wide and a thick 4 mm thick SnO layer.
Working conditions
The glass was heated to a temperature of 600 ° C and moved at a distance of 6 mm from the nozzle at a speed of 2 m / day. A mixture of nitrogen and hydrogen (60:40) was used as a carrier gas, and the flow rates of this gas were regulated by valves 23a, 24a and 37a to the following values: 60 l / h for receiver 21 containing liquid SnCl, 60 l / h for receiver 22, containing 42, and 20 l / h - for receiver 36, containing liquid chloride of antimony SbCl. In addition, the receivers were heated so that the reagent consumption was 2 mol / h SnCl, 2 mol / h HiO and 0.1 mol / h.
A SnO layer with an additive having an electrical resistivity of about 70 Ohms and a transparency of 60% was obtained.
Other characteristics, such as mechanical strength, resistance to impact, tearing off or cutting with diamond, resistance to acids, the possibility of heat treatment, tempering of glass on which the layer is deposited, are equivalent to the characteristics of SnOj layers without additives deposited in the manner already described. Its reflectivity is almost identical to the reflectivity of the glass on which the resulting layer was deposited.
Using the same device and under operating conditions differing from the indicated operating conditions only by the fact that the speed of movement of the plate V was increased to about 10 m / min, the SnO layer with antimony added, having approximately
1A) 910
10 them, with: the average prorichtimost (Kts) 500 Ohms, transmittance from - 15% learning and mechanical properties,
identical to those obtained with the SnO S layer
also with added antimony applied
on a glass plate moving at a speed of 2 m / min.
The resistivity, reflectivity and transparency of the SnO layers on the glass can be improved to a great extent if these layers are layers with fluoride additives. In this, it is preferable to use the device described with reference to FIG. 1, supplemented with a balloon 41, to contain hydrogen fluoride gas (HP) and a pipeline 42 connecting this balloon with pipeline 30, which are shown with a dash line.
A 4 mm thick glass heated to about 600 ° C was coated with a 900 nm SnO layer with fluorine added by passing it in front of the nozzle at a speed of 2 m / min and about 6 mm from this nozzle. Flow rate of carrier gas (mixture 60%
Hj) was 60 L / h for SbCl and water vapor. The flow rate of the HF was about 1 l / min.
., with a layer of fluorine-added Sn02 had very high characteristics. In fact, its electrical resistivity was (Rp) 20 ohms, the reflectivity
0 to visible light exceeded that of glass carrying this layer, and its reflectivity to infrared radiation was especially high (about 75%). Besides,
1, the transmittance of visible light was 90%. Characteristics of mechanical strength were also quite high: glass with a deposited layer of SnO, j with the addition of fluorine could undergo heat treatment, hardening, identical to the treatments that some autoshield glasses, for example, their side windows, are usually subjected to. You can also give
With such a plate, the convexity in the hot state (approximately 65 (() with a radius of curvature of 15 cm without changing the characteristics of the SnOj layer with the added additive. In addition, the glass
the plate with the layer applied in this way could be processed in the usual way (cut, sanded, etc.) without any damage to the layer. The SnOj layer with the addition of F had a higher hardness than the hardness of the glass on which it was applied, and there were no scratches on it, and.
10 SnO had an electrical resistivity of approximately (RQ) 40 ohms. Other characteristics of the physical, optical, or mechanical properties remained compatible with the character; moreover, its chemical resistance to acids and its resistance to impact were particularly high.
Using this device (Fig. 3) and under operating conditions differing only in the rate of movement of the fluorine-added layer of fluorine, of type V, which is approximately 10 g / min of hydrogen obtained by introducing hydrogen, a layer of SnOj was obtained, with the addition of fluorine, having a thickness of about 10 nm, an average electrical conductivity (R) of 200 Ohms, a transmittance of almost 100% for visible
into the carrier gas (device according to FIG. 1, supplemented with balloon 41).
The uses of glass plates of all sizes with an applied layer of SnOj with or without the addition of antimony or fluorine can vary widely depending on their 25 physical or electrical characteristics.
light, infrared reflectivity of 25% and mechanical properties identical to those obtained with the SnOj layer also with fluorine added when the glass plate was moved at a speed of 2 m / min.
Although in the device shown in Fig. 1, supplemented with a balloon 41, the type of use of glass plates of all sizes with an applied layer of SnOj with or without the addition of antimony or fluorine can vary widely depending on their physical or electrical characteristics.
Thus, the proposed device allows to obtain coatings containing gaseous HF, and piping 42 on the surface of the moving belt, connecting the cylinder with resistivity 20 to pipeline 30, uses hydrogen introduced into the gas as a reducing agent. carrier (nitrogen), it is also possible to provide a device that allows you to get a layer of SnO with fluorine additives, in which the reducing agent
1500 Ohm and transparency 60-100%. Formula
of
rete n i
35
A device for the continuous deposition of a metal oxide coating on the surface of a moving glass ribbon heated to at least 600 ° C.
will get from methanol CHjOH. This new device will be a combination of devices obtained by hydrolysis of the halide shown in Figures 1 and 2. Practically this metal containing a slit-like one will be a nozzle device formed by the shaped walls in Figure 2 with the balloon added , networks for supplying a nozzle 41 for HF, connected to a water vapor line and gaseous halogen 30 through pipe 42, and here 45 is a metal nida or mixture of the latter with
carrier gas, ducts for removal of reaction gases, characterized in that, in order to reduce
for the device variant in figure 1, are indicated by a dashed line.
In this case, the receivers 21,22
resistivity at high
and 31 will be fed with nitrogen at a cost of 50 transparency of the coating, the nozzle will be 60 l / h and the flow rate of HF will be 0.1 l / h. Their temperature should be brought to such a level that the expenses of the reactants fed to the nozzle 2 are 1 mol / h for SnCl, 1 mol / h for dL and 2 mol / h for CHjOH.
Under the above conditions, a 4 mm thick glass heated to about
but with two reflective surfaces and three isolated channels, the channels forming the profiled walls converge to an imaginary edge, 55 in total for all channels and located in the plane of the tape surface, the power network of the halide nozzle is connected to the central channel, and the water supply network of the nozzle is steam is connected
600 ° С, a layer of SnOj was added with the addition of fluorine 600 nm thick by transmission in front of the nozzle 2, the temperature of which
about 110 C was maintained
in the manner described at a speed of 2 m / min and at a distance of about 6 mm from this nozzle.
Thus obtained layer
SnO had an electrical resistivity of about (RQ) 40 ohms. Other characteristics of the physical, optical, or mechanical properties remained consistent with the characteristics of the layer with the addition of fluorine, obtained by the introduction of hydrogen directly
into the carrier gas (device according to FIG. 1, supplemented with balloon 41).
The uses of glass plates of all sizes with an applied layer of SnOj with or without the addition of antimony or fluorine can vary widely depending on their physical or electrical characteristics.
Thus, the proposed device allows to obtain coatings on the surface of a moving glass tape with a resistivity of 20-
1500 Ohm and transparency 60-100%. Formula
of
rete n i
Thus, the proposed device allows to obtain coatings on the surface of a moving glass tape with a resistivity of 20-
A device for the continuous deposition of a metal oxide coating on the surface of a moving glass ribbon heated to at least 600 ° C.
resistivity at high
but with two reflective surfaces and three isolated channels, the channels forming the profiled walls converge to an imaginary edge, 55 in total for all channels and located in the plane of the tape surface, the power network of the halide nozzle is connected to the central channel, and the water supply network of the nozzle is steam is connected
1371499
with the other two, located on the sides of the central channel, and the ratio of the distance between the imaginary edge and the nozzle outlet to the width
27
23
5 ® ® / ® ® ® T3 45
Phases. one
each channel is 15-60, and the length of the reflected surfaces is 10–20 times greater than the sum of the outlets of the three nozzles.
n oreactifs
F
4tr
23
21
fig.Z
权利要求:
Claims (2)
[1]
Claim
A device for the continuous deposition of a coating of metal oxide on the surface of a moving glass strip heated to at least 600 ° C obtained by hydrolysis of a halide of this metal, containing a slit-like nozzle formed by profiled walls, networks for supplying water vapor and a gaseous metal halide to the nozzle the latter with a carrier gas, a duct for removing reaction gases, characterized in that, in order to reduce the resistivity with high transparency of the coating, the nozzle is made with two reflecting the surfaces and three isolated channels, the shaped walls forming the channels converge to an imaginary edge common for all channels and located in the plane of the surface of the tape, the halogen nozzle supply network is connected to the central channel, and the nozzle supply network is connected with water vapor
1371499 14 of each channel is 15-60, and the length reflect1> (their surfaces are 10-20 times the sum of the outlet openings of the three nozzles.
with two others located on the sides of the central channel, and the ratio of the distance between the imaginary edge and the nozzle exit to the width
AL η
[2]
2kt
I
23a
2k a 12a 29 εζ ___ / __
Η 0 + reactifs
about p
(Riga. 2
-- 2 - from s ~
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同族专利:
公开号 | 公开日
JPS55130842A|1980-10-11|
GB2044137A|1980-10-15|
TR20840A|1982-10-19|
IT1140560B|1986-10-01|
ES8100356A1|1980-11-01|
AU5513980A|1980-08-21|
SE8001131L|1980-08-15|
DE3005797A1|1980-08-28|
KR830001668A|1983-05-18|
IT8019855D0|1980-02-12|
BE881708A|1980-05-30|
CS274254B2|1991-04-11|
ES488517A0|1980-11-01|
DE3005797C2|1984-10-31|
AU538579B2|1984-08-23|
CS98280A2|1990-09-12|
BR8000891A|1980-10-21|
GB2044137B|1983-08-03|
MX154318A|1987-07-08|
ZA80824B|1981-02-25|
KR830002475B1|1983-10-26|
US4351267A|1982-09-28|
NL179043C|1986-07-01|
PL221965A1|1980-11-17|
SE446091B|1986-08-11|
FR2448943B1|1982-12-03|
US4294868A|1981-10-13|
CA1136007A|1982-11-23|
JPS6133904B2|1986-08-05|
FR2448943A1|1980-09-12|
NL8000897A|1980-08-18|
CH628600A5|1982-03-15|
DD149058A5|1981-06-24|
PL126146B1|1983-07-30|
引用文献:
公开号 | 申请日 | 公开日 | 申请人 | 专利标题

GB1307216A|1969-04-23|1973-02-14|Pilkington Brothers Ltd|Treating glass|
US3814327A|1971-04-06|1974-06-04|Gen Electric|Nozzle for chemical reaction processes|
CH544156A|1971-04-16|1973-11-15|Bbc Brown Boveri & Cie|Process for the production of oxide semiconductor layers and device for carrying out the process|
DE2121319A1|1971-04-30|1973-01-18|Rocholl Martin Ggottfried Dipl|Electrically heating coating for glass plates - - consisting of electroconductive layer contg a doping element|
FR2210675B1|1972-12-15|1978-05-12|Ppg Industries Inc|
US3951100A|1972-12-15|1976-04-20|Ppg Industries, Inc.|Chemical vapor deposition of coatings|
US3850679A|1972-12-15|1974-11-26|Ppg Industries Inc|Chemical vapor deposition of coatings|
DD109033A1|1973-12-11|1974-10-12|IT1134153B|1979-11-21|1986-07-31|Siv Soc Italiana Vetro|NOZZLE FOR STORING CONTINUOUSLY ON A SUBSTRATE A LAYER OF A SOLID MATERIAL|
CA1172918A|1980-02-15|1984-08-21|William E. Hofmann|Process for making glass surfaces abrasion-resistantand article produced thereby|
BE889217A|1980-06-19|1981-12-15|Bfg Glassgroup|METHOD AND DEVICE FOR FORMING A UNIFORM COATING WITH MULTIPLE COMPONENTS|
CH643469A5|1981-12-22|1984-06-15|Siv Soc Italiana Vetro|Installation for continuous drop on the surface of a substrate door high temperature, layer solid matter.|
US4451000A|1982-06-11|1984-05-29|Hollis Engineering, Inc.|Soldering apparatus exhaust system|
US4477494A|1982-07-12|1984-10-16|Glass Containers Corporation|Process for forming rust resistant tin oxide coatings on glass containers|
US4524718A|1982-11-22|1985-06-25|Gordon Roy G|Reactor for continuous coating of glass|
GB2139612B|1983-05-13|1987-03-11|Glaverbel|Coating a hot vitreous substrate|
AU3994785A|1984-02-13|1985-08-27|Schmitt, J.J. 111|Method and apparatus for the gas jet deposition of conductingand dielectric thin solid films and products produced there by|
US5122394A|1985-12-23|1992-06-16|Atochem North America, Inc.|Apparatus for coating a substrate|
US4928627A|1985-12-23|1990-05-29|Atochem North America, Inc.|Apparatus for coating a substrate|
JPH0645881B2|1986-03-28|1994-06-15|日本鋼管株式会社|Silicidation treatment method for steel plate in continuous treatment line|
JPH0544418B2|1986-11-28|1993-07-06|Nippon Electric Co|
EP0276796B1|1987-01-27|1992-04-08|Asahi Glass Company Ltd.|Gas feeding nozzle for a chemical vapor deposition apparatus|
GB2209176A|1987-08-28|1989-05-04|Pilkington Plc|Coating glass|
US4853257A|1987-09-30|1989-08-01|Ppg Industries, Inc.|Chemical vapor deposition of tin oxide on float glass in the tin bath|
US5136975A|1990-06-21|1992-08-11|Watkins-Johnson Company|Injector and method for delivering gaseous chemicals to a surface|
GB9300400D0|1993-01-11|1993-03-03|Glaverbel|A device and method for forming a coating by pyrolysis|
US5453383A|1994-06-14|1995-09-26|General Mills, Inc.|Method of applying sugar coating by using steam assisted discharge nozzle|
US5534314A|1994-08-31|1996-07-09|University Of Virginia Patent Foundation|Directed vapor deposition of electron beam evaporant|
FR2724923B1|1994-09-27|1996-12-20|Saint Gobain Vitrage|TECHNIQUE FOR THE DEPOSITION OF PYROLYSIS COATINGS OF A PRECURSOR GAS COMPOSITION |
US5571332A|1995-02-10|1996-11-05|Jet Process Corporation|Electron jet vapor deposition system|
GB2302102B|1995-06-09|1999-03-10|Glaverbel|A glazing panel having solar screening properties and a process for making such a panel|
GB2302101B|1995-06-09|1999-03-10|Glaverbel|A glazing panel having solar screening properties|
US6231971B1|1995-06-09|2001-05-15|Glaverbel|Glazing panel having solar screening properties|
CA2178033C|1995-06-09|2007-11-13|Robert Terneu|Glazing panel having solar screening properties and a process for making such a panel|
GB9515198D0|1995-07-25|1995-09-20|Pilkington Plc|A method of coating glass|
MY129739A|1996-01-09|2007-04-30|Nippon Sheet Glass Co Ltd|Coated glass for buildings|
US5698262A|1996-05-06|1997-12-16|Libbey-Owens-Ford Co.|Method for forming tin oxide coating on glass|
US6238738B1|1996-08-13|2001-05-29|Libbey-Owens-Ford Co.|Method for depositing titanium oxide coatings on flat glass|
GB9616983D0|1996-08-13|1996-09-25|Pilkington Plc|Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass|
US7096692B2|1997-03-14|2006-08-29|Ppg Industries Ohio, Inc.|Visible-light-responsive photoactive coating, coated article, and method of making same|
US6027766A|1997-03-14|2000-02-22|Ppg Industries Ohio, Inc.|Photocatalytically-activated self-cleaning article and method of making same|
US6103015A|1998-01-19|2000-08-15|Libbey-Owens-Ford Co.|Symmetrical CVD coater with lower upstream exhaust toe|
US5904958A|1998-03-20|1999-05-18|Rexam Industries Corp.|Adjustable nozzle for evaporation or organic monomers|
US6268019B1|1998-06-04|2001-07-31|Atofina Chemicals, Inc.|Preparation of fluorine modified, low haze, titanium dioxide films|
DE19923591A1|1999-05-21|2000-11-23|Fleissner Maschf Gmbh Co|Device with a nozzle bar for generating liquid jets for applying a jet to the fibers of a web|
GB9913315D0|1999-06-08|1999-08-11|Pilkington Plc|Improved process for coating glass|
DE10046557B4|2000-09-19|2006-07-27|Datron-Electronic Gmbh|Device for the metered dispensing of a material strand consisting of several different viscous media by means of coextrusion and multi-functional combination seal|
JP4124046B2|2003-07-10|2008-07-23|株式会社大阪チタニウムテクノロジーズ|Metal oxide film forming method and vapor deposition apparatus|
US20060021574A1|2004-08-02|2006-02-02|Veeco Instruments Inc.|Multi-gas distribution injector for chemical vapor deposition reactors|
US8398770B2|2007-09-26|2013-03-19|Eastman Kodak Company|Deposition system for thin film formation|
US8709160B2|2008-08-22|2014-04-29|United Technologies Corporation|Deposition apparatus having thermal hood|
US8404047B2|2008-09-16|2013-03-26|United Technologies Corporation|Electron beam vapor deposition apparatus and method|
US8343591B2|2008-10-24|2013-01-01|United Technologies Corporation|Method for use with a coating process|
US20100104773A1|2008-10-24|2010-04-29|Neal James W|Method for use in a coating process|
US20100189929A1|2009-01-28|2010-07-29|Neal James W|Coating device and deposition apparatus|
US20100247809A1|2009-03-31|2010-09-30|Neal James W|Electron beam vapor deposition apparatus for depositing multi-layer coating|
WO2013019285A2|2011-03-23|2013-02-07|Pilkington Group Limited|Apparatus for depositing thin film coatings and method of deposition utilizing such apparatus|
GB201114242D0|2011-08-18|2011-10-05|Pilkington Group Ltd|Tantalum oxide coatings|
GB2510615A|2013-02-08|2014-08-13|Glyndwr University|Gas blade injection system|
US10704144B2|2015-10-12|2020-07-07|Universal Display Corporation|Apparatus and method for printing multilayer organic thin films from vapor phase in an ultra-pure gas ambient|
WO2017158145A1|2016-03-18|2017-09-21|Basf Se|Metal-doped tin oxide for electrocatalysis applications|
JP6529628B2|2018-04-17|2019-06-12|東芝三菱電機産業システム株式会社|Film deposition system|
法律状态:
优先权:
申请号 | 申请日 | 专利标题
CH141279A|CH628600A5|1979-02-14|1979-02-14|PROCESS FOR CONTINUOUSLY DEPOSITING, ON THE SURFACE OF A SUBSTRATE CARRIED AT HIGH TEMPERATURE, A LAYER OF A SOLID MATERIAL AND INSTALLATION FOR THE IMPLEMENTATION OF THIS PROCESS.|
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